Wafer metrology system OCD

OCD Solutions technology optimizes the full capability and connectivity of the Atlas and IMPULSE systems for optical critical dimension (OCD) metrology. Product Overview Onto Innovation’s OCD technology offers powerful OCD modeling and advanced machine learning capability, as well as next-generation real-time regression, offline sensitivity analysis tools and comprehensive GUI and structure input for true multi-variant modeling. Both the Ai Diffract and SpectraProbe software packages deliver advanced capabilities in intuitive and easy to deploy hardware form factors. Each component extends seamless OCD capabilities to Atlas standalone and IMPULSE integrated metrology systems, from offline recipe support and development to fab-wide networking and connectivity for easy fleet management. Ai Diffract™ Software AI-guided OCD modeling and analysis software for high accuracy in-line optical metrology and offline recipe development Ai Diffract software is a powerful modeling, visualization and analysis software with an intuitive 3D modeling interface to simplify building and visualization of today’s most complex semiconductor devices. Ai Diffract software’s proprietary fitting algorithms enable fast and accurate calculations for signal processing for high fidelity model-based measurements. Automation features for spectral fitting, recipe optimization, and sensitivity analysis offer great user productivity. The first in market AI-guided engine synergizes physics-based modeling and machine learning to deliver the most robust solution with quick time to solution.