Wafer metrology system IMPULSE+

Integrated metrology platform powered by industry leading optics and machine learning solutions, combining high sensitivity with high throughput for CMP, deposition, etch and litho applications. An integrated metrology standard, the IMPULSE+ system offers maximum sensitivity and accuracy to CMP process excursions and enables device makers to establish APC control solutions with high-accuracy feedback. With OCD solution software enabling direct measurements within device and active areas, users are able to monitor minor process excursions and optimize their processes for higher yields. The IMPULSE+ system works in conjunction with the Atlas and OCD software analysis solutions, enabling cross-module process optimization and comprehensive fab-wide process control. The IMPULSE+ system is widely adopted across key steps in DRAM, 3D-NAND, CMOS image sensor and foundry/logic device manufacturing.