PVD deposition machine RT-CsI950

thermal evaporationmetalized filmvacuum

X-Ray Scintillator(CsI) Deposition System, CsI High Vacuum Metallizing Machine CsI High Vacuum Deposition System is exclusively designed for CsI metallization on scintillation screens in an extremely high vacuum environment. The CsI scintillators 200～600µm in thickness ranges with high uniformity of thickness and brightness performance. Ultra- High Spatial Resolution of Imaging; Fast response for sharper imaging; Class leading edge-to-edge image areas; Optical absorb layers or reflector layers; Low patient X-ray dose; Application: for security check and inspection, high energy physics education, nuclear radiaton detection and medical imagings: chest examination, mamography, dental inter oral and panoramic. Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate 1. Efficiency: RT-CsI950 model is with 2-rotary rack structure . Double-capacity for max. size substrate: 500 x400mm. 2. Repeatability & Reproducibility: Through high precised parameter control system, Automated process control software and program, User friendly operation. 3. Reliability: 24/7 days non-stop operation; Inficon Film Thickness Controller to monitor the film thickness inline. Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control Rotary rack is designed with Servo-Motor for high accuracy and stability. 4. Safety: High vacuum pump: Magnetic Suspension Molecular Pump, with nitrogen gas blowing device to avoid hazard material be exposed in the air; All electrodes are equipped with safety protection sleeves.