Magnetron sputtering machine PVD

Overview
Upgrade for PVD machines. We offer hardware and software updates for your PVD machine. Complete upgrade including substrate heating, magnetron cathodes, reactive gas regulation, vacuum enclosure thermal control and software.

Applicable ranges / models
HF and MW6

Upgrades and interventions offered

• Substrate holder heating from 200 to 800°C
• Addition of shutters, substrate holder motion, pressure and temperature measurement
• Thermal regulation of the vacuum enclosure
• Renovation of magnetron cathodes or arc sources
• Reactive gas regulation by optical spectrometry

Features / technical specifications

• Graphite heating for magnetron sputtering PVD machines
• Magnetron cathodes with shutters for sputtering PVD
• Rotary substrate holder cover
• Substrate holder temperature range: 200 to 800 °C
• Integrated measurements: pressure and temperature
• Thermal regulation of the vacuum chamber
• Possible renovation: magnetron cathodes or arc sources
• Reactive gas control via optical spectrometry