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MOCVD deposition machine TurboDisc K475i As/P
thin-film

MOCVD deposition machine - TurboDisc K475i As/P - VEECO - thin-film
MOCVD deposition machine - TurboDisc K475i As/P - VEECO - thin-film
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Characteristics

Method
MOCVD
Deposition type
thin-film

Description

Industry’s Highest Productivity As/P MOCVD System with the Best-in-Class Yields Veeco’s new TurboDisc K475i As/P MOCVD System is the industry’s best reactor for the production of red, orange, yellow (R/O/Y) LEDs, as well as multi-junction III-V solar cells, laser diodes and transistors. The K475i system features a new reactor design incorporating Veeco’s Uniform FlowFlange™ technology producing films with very high uniformity and improved within-wafer and wafer-to-wafer repeatability with the industry’s lowest particle generation. The simple design of the Uniform FlowFlange technology provides ease-of-tuning for fast process optimization and fast tool recovery time after maintenance for the highest productivity for applications such as lighting, solar, laser diodes, pseudomorphic high electron mobility transistors (pHEMTs) and heterojunction bipolar transistors (HBTs). New Uniform FlowFlange technology design enables best-in-class uniformity and process repeatability capable of driving greater yields Robust reactor design provides ease-of-use and faster recovery after maintenance for maximum uptime Industry’s highest productivity due to full automation Production proven platform provides lowest cost of ownership

Exhibitions

Meet this supplier at the following exhibition(s):

electronica Munich 2026
electronica Munich 2026

10-13 Nov 2026 Munich (Germany) Hall B1 - Stand 341

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