Rack-mount power supply EMC

DC/DCwith overload protectionwith overcurrent protection

The EMC series of Wisman high voltage power supplies are comprehensive multi-output high voltage power supplies for focused ion beams. Typical applications include transmission and scanning electron microscopy; semiconductor analysis, milling and repair of optical disc drive heads, ion; beam etching and focused ion beam lithography. The modular design approach allows individual components to be easily configured in a common rack-mounted assembly on a large chassis. Interface, logic and control circuits are manufactured using surface mount technology to minimise cost and size. Integrated accelerating power supply, filament power supply, absorber power supply, suppressor power supply and lens power supply. Low output ripple, excellent tuning ratio, stability, temperature drift and accuracy. Wisman's unique high voltage suspension and digital control technology. the EMC series of high precision modules are competitively priced and ideal for OEM applications. APPLICATIONS： Field Emission Scanning Electron Microscope Electron beam power supply Semiconductor Analysis, Processing and Repair Ion Beam Etching Focused Ion Beam Lithograph Technical parameters： Accelerated power supply Output current: 100μA, 300μA Ripple: 100μA:75 mV P-P，from 0.1 HZ to1MHZ 300μA:120 mV P-P，from 0.1 Hzto1MHZ Input Adjustment Ratio： Input variation +/-10% for 100mV Load Adjustment Rate: ± 0.01%, maximum voltage, full load variation Stability： 1.5V/10 hours after 2 hours of preheating Temperature coefficient: 25 PPM / °C Filament power supply: Ripple: Load Adjustment Ratio: ± 0.1 %, maximum voltage, full load variation Line Adjustment Ratio: +/-10% variation to 5mA