Diffusion furnaces

4 companies | 9 products
  • Type
  • Functions
  • Heat sources
  • Temperature range
  • Sizes
  • Other characteristics
  • Product applications

The furnace is a heat treatment system for silicon wafer, IGBT, polyimide and thin wafer oxidation, diffusion and CVD. As our flagship model, the furnace...

The heat treatment system performs silicon wafer, IGBT, polyimide and thin wafer oxidation, diffusion and CVD. Since the height is...

The vertical furnace with a built-in stocker processes 8-inch wafers at ultra high temperatures in large batches.
The furnace is a semiconductor heat treatment...

The large-batch, diffusion, LPCVD, vertical furnace performs 4- to 8-inch wafer ultra high-temperature treatment. The system can be flexibly configured to meet your production...

The horizontal furnace is suitable for solar battery and photovoltaic (PV) cell production. 100 – 156 square wafers can be mass-processed...


The Despatch In-line Diffusion Furnace incorporates advanced infrared thermal technology that provides the tight temperature uniformity needed for increased cell efficiencies. Air is passively preheated as it enters the chamber and lamps on top and...


In the diffusion furnace the phosphorous atoms which were deposited in the upstream process, are now embedded...

The system is equipped with four automatic cantilever system to load and unload each process tube separately. One tube can handle...


Phosphorus Diffusion is used in the manufacture of solar cells to create the emitter. Silicon wafers are coated with phosphoric acid fired at temperatures between 800oC and 1000oC...

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