To generate a voltage potential within the solar cell, phosphorus atoms are diffused into the crystal lattice of the wafers. This process is accomplished in a diffusion furnace using ...
... used as carrier gas for the POCl3 liquid. An additional oxidation steps follows to finish the process. After the adjusted diffusion time the tube opens to get unloaded and reloaded again.
The furnace is a heat treatment system for silicon wafer, IGBT, polyimide and thin wafer oxidation, diffusion and CVD. As our flagship model, the furnace is equipped with a large-capacity ...
The heat treatment system performs silicon wafer, IGBT, polyimide and thin wafer oxidation, diffusion and CVD. Since the height is less than 3000 mm, this model can be easily introduced and accomplish short cycle time ...
Maximum temperature: 0 °C - 1000 °C
The Despatch In-line Diffusion Furnace incorporates advanced infrared thermal technology that provides the tight temperature uniformity needed for increased cell efficiencies. Air is passively preheated ...
Maximum temperature: 800 °C - 1000 °C
... processes cannot keep pace with the cost pressure facing PV manufacturers today. BTU's solution is the Meridian™ In-Line Diffusion Furnace. The system can be configured to process up to 1,500 wafers ...
Maximum temperature: 0 °C - 1100 °C
... uniformity in the firing furnace. In addition to excellent thermal uniformity the firing furnace has to control the porosity of the ceramic. For firing steps above 1100°C, BTU offers the convection batch ...