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... depositing an Al2O3 thin film on the front surface of the wafer of a crystalline solar cell by the thermal Atomic Layer Deposition (ALD) to form a passivation layer. Spec High Throughput: 12,800 ...
AlO+SiN Thin-film Deposition. • Atomic layer deposition process, with better film uniformity. • Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process ...
... Ideal for laboratory tests and industrial production of small pieces Perfectly suited for 3D complex-shaped components ALD deposition of Al2O3 and TiO2 Remote plasma source Gas panel with 4 heated ...
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