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... coil (MS-ICP) and its application for array of compound semiconductor materials. The APX300-S can process wafers used in the power devices, SAW filters, communication devices or MEMS sensor markets. Our Multi-Spiral ...
... D632B Laser Etching Machine is mainly designed for the polyfinger process of the back of TOPCon cells. By patterning and modifying the PSG film, it works in conjunction with subsequent wet process to achieve localized ...
... The Edge Isolation + PSG Etching Inline System combines several process steps in one system with modular design. On the one hand the emitter layer on the rearside of the wafer generated during the diffusion process is ...
... rate silicon etching for a variety of applications. Deep reactive ion etching (DRIE) of silicon uses the Bosch Process, which switches the plasma chemistry repeatedly between etch (SF6) and passivation(C4F8) steps, to ...
KLA Corporation
... via a controlled anhydrous HF/alcohol etch process. The Monarch 3 is a compact module includes a 3- wafer process chamber including a semi-automatic 3- wafer loader with load lock, and is designed for research laboratories ...
KLA Corporation
... RENA’s wet etching tool for caustic or acidic applications is built to achieve outstanding surface results in semiconductor wafer production. Acidic etching combined with a fast transport system enables ...
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