Pulsed magnetron HiPIMS

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High Power Impulse Magnetron Sputtering or HiPIMS is a relatively recent advance in pulsed sputtering technology using very high energy, short duration pulses to generate a plasma discharge that ionizes a large percentage of the sputtered atoms. The ionized flux can then be guided for increased control of the coating properties. In HiPIMS, a high peak voltage and high current density is applied to the sputtering target in pulses at relatively short pulse lengths with equally low frequencies and long periods of time between cycles. The pulse durations are typically in the range of 50 to 200 microseconds with frequencies in the 500 hertz range while the time between cycles can be as little as several hundredths of a second. This allows for a low duty cycle, in the 10% range which minimizes heating while maintaining process stability. There are several advantages to using HiPIMS technology to change the morphology and structure of the resultant films. Properties including density, hardness, surface topography, refractive index, and adhesion can all be modified and enhanced through the Hipims process. Angstrom Sciences has developed a series of sputtering cathodes capable of sustaining these extreme power densities for continuous long running production applications. Along with our patented turbulent target cooling, Angstrom Sciences’ High Power Impulse Magnetron Sputtering Cathodes incorporate additional cooling channels in the anode body and mounting flanges to maintain optimum cooling during process operation.