Stacked architecture positioning system CHARON2
6-axissingle-axis3-axis

stacked architecture positioning system
stacked architecture positioning system
stacked architecture positioning system
stacked architecture positioning system
stacked architecture positioning system
stacked architecture positioning system
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Characteristics

Number of axes
6-axis, single-axis, 3-axis, 4-axis, 5-axis, 2-axis, 7-axis
Other characteristics
compact, stacked architecture

Description

The CHARON2 platform is built on a robust, reliable and elegantly stacked architecture, designed with modularity and scalability principles in mind. It starts from a standalone X axis to a complete motion system of up to 7 axes. Datasheets performance are available with different electronics configurations. Its compatibility with current and future modules and options allows coverage of the broadest application space and use cases. This flexible, scalable, modular and upgradeable platform offers an entry level to all semiconductor applications and many use cases of other markets, for instance medical, pharmaceutical, material science and others. Continuously evolving in all served markets, the CHARON2 platform support OEM’s product lifetime extension as well as upgrade paths. Its position accuracy of ±1 µm level paired with excellent bidirectional repeatability and high dynamics sustains applications development in all technology and industry fields. Characteristics - Total stroke : up to 650 mm x 410 mm - Available in 9 standards x 2 electronics = 18 configurations as off-the-shelf products - Compact footprint - Payload up to 30 Kg - Included options and features: rails particle suction (ETEL patent), custom signals, pneumatic lines, and more. - ISO1 clean room compatibility - Tip-Tilt correction with the Z3TM combined module - Built-in vacuum supply at chuck level - Short move and settle times Main specifications - Position accuracy: ±1 µm for XY and ±3 arcsec for T - Position stability: ±2 nm for XY, ±0.02 arcsec for T and ±3 nm for fine Z - Bidirectional repeatability: ±0.4 µm for XY, ±2 arcsec for T and ±0.03 µm for fine Z

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Exhibitions

Meet this supplier at the following exhibition(s):

BIEMH 2024
BIEMH 2024

3-07 Jun 2024 Bilbao (Spain) Hall 6 - Stand C-04

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    *Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.