Atomic force microscope NX-Mask

for photomask repairnanoscopeautomatic

Park NX-Mask is the most effective, safe and efficient Photomask Repair System for High-end EUV Mask Repairs. It provides an all-in-one solution - from automatic defect review to repair and verification - accelerating throughput with unprecedented repair efficacy. Key Features ✔No risk of damage and seamless repair of any type of defects ✔Compatible with a dual pod for handling EUV masks ✔All-in-one solution for locating defects and post-repair verification