OutlineSuitable for multilayer packaging by combining with semiconductor wafers such as MEMS devices.
FeaturesImprove bonding yield with device wafers- Control sagging around the holes
- Minimize chipping size
- Availability down to ≦10 μm for controlled chipping
Options- Remove microcracks from machined surfaces to control particles
- Prevent malfunctions in bonding with MEMS devices caused by particles
Standard specifications- Material: Glass
- Maximum glass diameter: ≦φ200 mm
- Minimum thickness: 0.15 mm
- Thickness tolerance: ±0.01 mm
- Minimum hole size: φ0.3 mm
- Window shape: available upon request
- Window size tolerance: ±0.02 mm
- Chipping size: ≦100 μm (can be controlled to ≦10 μm)
- Cross-section shape: Straight / Taper / Step
- Metallization process: Available
End user market / Applications- Projector
- Display devices for projectors and similar applications
- Semiconductor
- RF-MEMS switches
- Image sensors
- AV / Mobile
- RF-switches/relays for smartphones, portable consoles, digital cameras, car navigation systems
- Automotive
- Pressure sensors, acceleration sensors
- Gyroscopes, LED components
- Biotechnology / Medical
- Analytical chips for DNA/drug-discovery-screening analyzers
- Microreactors for biochemical reaction/electrophoresis analyzers
- Bioreactors for chemical/microorganism-detection sensors
- Industrial gas-detection sensors
Characteristics / Technical specifications- Target: Multilayer assembly of semiconductor wafers, including MEMS devices
- Material: Various glass types
- Maximum glass diameter: ≦φ200 mm
- Minimum thickness: 0.15 mm
- Thickness tolerance: ±0.01 mm
- Minimum hole size: φ0.3 mm
- Window shape and sizes: available upon request (window size tolerance ±0.02 mm)
- Chipping control: ≤100 μm standard; controllable to ≦10 μm
- Through-hole cross-section options: Straight, Taper, Step
- Metallization: Available
- Options: Microcrack removal and surface treatment to reduce particles and improve bonding yield