OutlineSquare micro through-holes without rounded corners (R=0) enabling narrow-pitch and small-diameter patterns that were previously impractical.
Features- High-density micro through-holes
- Example: up to 150,000 holes of 0.1×0.1 mm on a 3‑inch wafer
- High aspect-ratio through-holes (up to 1:10)
- Typical aspect ratio range 1:8–1:10; straight or tapered cross-sections available
- Minimized chipping
- Improves contact for anodic bonding to Si
Options- Sidewall metallization
- Reduces optical interference or absorption between holes
- Selectable cavity geometry
Standard specificationsMaterial: Borofloat 33 (BF33) etc.
Glass size: ≦φ150 mm
Min. thickness: 0.25 mm
Thickness tolerance: ±0.01 mm
Min. hole size: □0.07 mm
Hole size tolerance: ±0.02 mm
Max. aspect ratio: 1 : 10
Particle control: Available
Cross-section shape: Straight / Tapered
Characteristics / technical specifications- Material: Borofloat 33 (BF33) etc.
- Glass size: ≦φ150 mm
- Minimum thickness: 0.25 mm; tolerance ±0.01 mm
- Minimum hole size: square 0.07 mm; tolerance ±0.02 mm
- Maximum aspect ratio: up to 1 : 10 (typ. 1:8–1:10)
- Cross-section: straight or tapered through-holes
- High-density microholes: e.g. 150,000 holes of 0.1×0.1 mm on a 3‑inch wafer
- Sidewall metallization available to control optical interference/absorption
- Particle control and cleanroom handling available
- Minimized chipping to improve anodic bonding performance