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Volumetric flow rate: 0 l/min - 0.1 l/min
Process temperature: 0 °C - 80 °C
Process pressure: 1.1 bar - 3.5 bar
... Critical semiconductor manufacturing processes continuously desire precision gas flow control devices that enable both future innovation, and lab to fab transition of leading edge memory and logic device. HORIBA's propose ...
HORIBA STEC
Process temperature: 0 °C - 80 °C
Process pressure: 0.13 bar - 4 bar
Repeatibility: 0.01 % - 0.3 %
... CRITERION™ technology. D700WR can control flow rate down to 0.1% of full scale range which helps users to optimize the flexibility of gas delivery system. For example, if the system installs multiple MFCs for high and low flow ...
HORIBA STEC
Process temperature: 0 °C - 80 °C
Process pressure: 3.5 bar - 7.5 bar
Repeatibility: 0.03 % - 0.3 %
... less for improved throughput High Accuracy Flow rate accuracy for process gas has been improved with an advanced three-dimensional adjustment Fast Response Response: < 0.8 second Accurate, stable flow control ...
HORIBA STEC
Process temperature: 15 °C - 45 °C
Process pressure: 2.4 bar - 4.12 bar
... D700uF(Micro Flow) is designed for ≤ 5SCCM flow application. ≤ 5SCCM flow control has been very critical in high aspect ratio process. Specialized components and newly developed in-house ...
HORIBA STEC
Process temperature: 15 °C - 60 °C
Process pressure: 2.4 bar - 3.5 bar
... D700T is the best performance pressure-insensitive mass flow module designed for critical semiconductor manufacturing process. D700T adapted the HORIBA CRITERION pressure-based flow measure and control technology to provide ...
HORIBA STEC
Volumetric flow rate: 0.1, 0.3 l/min
Process pressure: 0.5 bar - 4 bar
Repeatibility: 0.15, 0.01 %
... avoid the mass flow controller crosstalk phenomenon caused by pressure fluctuations. The SEC-Z700S Series demonstrates high stability and controls the gas flow without effecting the upstream and downstream pressure ...
HORIBA STEC
... latest model in its series of ultra-thin mass flow controllers on January 14th. This product increases full-scale flow*1 by approximately seven times that of previous models and achieves a maximum mass flow ...
HORIBA STEC
Volumetric flow rate: 0 us gal/min - 100 us gal/min
Process temperature: 5 °C - 50 °C
Process pressure: 0.5 bar - 3 bar
... micro-litre to ultra low flow rate control Enable precision flow control of low boiling point and high viscosity liquids Ultra clean. Measurement Techniques Cooling Measurement Method The flow ...
HORIBA STEC