Thermal flow meter DZ-107

massfor gas

HORIBA STEC, Co., Ltd. announced the release of the DZ-107 as the latest model in its series of ultra-thin mass flow controllers on January 14th. This product increases full-scale flow*1 by approximately seven times that of previous models and achieves a maximum mass flow of 20 SLM*2, the highest in its class*3, while maintaining an ultra-thin 10 mm width. The DZ-107 also raises the maximum operation temperature from 45°C to 60°C to support gases used in precision manufacturing process of leading-edge semiconductors. These functional enhancements not only maintain the effectiveness of previous models in etching processes but also support Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) Applications that require high flow control. As modern semiconductor devices push the boundaries of miniaturization and integration, the requirements for mass flow controllers in processes such as etching and molding are becoming more sophisticated and complex. To meet a wide range of needs, semiconductor manufacturing equipment manufacturers are striving to balance the need to increase the number of mass flow controllers while also miniaturizing the gas panels*4 that install these devices. HORIBA STEC has developed the DZ-107 to fully enhance the product capabilities to address this challenge while maintaining the uniquely thin 10 mm width of the DZ-100 released in 2020. This includes increasing the full-scale flow and operation temperature range in addition to support for EtherCAT®*5. *1 Maximum flow rate that the device is calibrated to measure and control accurately *2 Standard Liters per Minute (SLM) provides a numerical value in liters that indicates