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The JBX-3050MV series is an electron beam lithography system for mask/reticle fabrication that meets the design rule of 45 to 32 nm. This system features pattern writing with high speed, high accuracy and high reliability, achieved by high-end technology.
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The OAI Model 5000 is an advanced, high-performance mask aligner and exposure tool that delivers ultra precise, front side, sub-micron alignment and resolution for the most demanding semiconductor device and surface MEMS applications.
The system is available in manual or fully automated versions, and is capable of performing sub-micron, level-to-level alignment. It's flexible design allows printing on various substrates - round or square - up to 200mm. The exposure system is compatible with photoresist in Near, Mid or Deep UV range.
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Micro/Nano Replication at its Best.
Low cost production solutions of nanostructures are in development that may be the driving forces of Semiconductor, MOEMS and optoelectronics technology tomorrow. In particular, Nanoimprint lithography (NIL) and its variations have been developed as a cost-effective alternative to high-resolution e-beam lithography to print sub-20 nm geometries.
Imprinting is based on the principle of mechanically pressing thin polymer film with a stamp containing the nanopattern, in a thermo-mechanical or UV curing process. The patterned polymer can act as a final device, e.g. lense for imaging sensors, micro fluidic chip, biomedical array etc. It can also be used as a high resolution mask for subsequent steps of the process.
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The OAI Model 8000 is an advanced, high-performance mask aligner and exposure tool that delivers ultra precise, front and back side, sub-micron alignment and resolution for the most demanding bulk and surface MEMS applications.
The system is available in manual or fully automated versions, and is capable of performing sub-micron, level-to-level alignment. It's flexible design allows printing on various substrates - round or square - up to 200mm. The exposure system is compatible with photoresist in Near, Mid or Deep UV range.
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| ... products without technical information |
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