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... monitoring of system operation. Laser positioning resolution Stage positions are measured and controlled in 0.6 nm steps as standard, and in 0.15 nm steps with an optional upgrade. System control Versatile ...
Jeol
... JBX-9500FS is a 100kV EB system that provides world-top-level throughput and positional accuracy among Spot beam lithography systems. This EB system can accommodate up to 300mmΦ wafer ...
Jeol
... Step-and-Repeat Nanoimprint Lithography System Step-and-Repeat Nanoimprint Lithography for Efficient Master Fabrication The EVG770 NT is a versatile platform for step-and-repeat (S&R) nanoimprint ...
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