Magnetron sputtering machine DEIMOS 5500

for mirror

Overview
The DEIMOS 5500 is a precision optics vacuum coater for magnetron sputter deposition, engineered to apply protected and enhanced aluminum or silver layers on large curved astronomical mirrors, delivering high reflectance, uniformity and coating durability.

Key benefits

• Highly uniform coating – electrically adjustable target inclination and distance adaptation to curved substrates ensure uniform protected or enhanced Al/Ag layers.
• Fast substrate handling – a rail system lets the lower chamber half move clear of the frame for full access and rapid substrate exchange.
• Flexible power modes – four sputter targets with options for DC pulsed or DC supply to meet coating process requirements.

Highlight features

• Movable cathode inclination – each target can be translated and inclined; electrical drives provide repeatable positioning with settings stored in production recipes.
• MF or DC glow discharge pre-cleaning – integrated glow discharge units enable controlled chamber cleaning and moisture removal; cycles can be saved in recipes.
• Accessible design – lower chamber on rails simplifies access to substrates, targets and components, especially for large diameters (up to 4.5 m), easing operation and maintenance.

Application
Intended for coating astronomical and other large precision optical mirrors with protected or enhanced aluminum or silver layers where reflectance, uniformity and durability are critical.

Characteristics / technical specifications

• Model: DEIMOS 5500
• Process: Magnetron sputter vacuum coating (precision optics vacuum coater)
• Coating materials: Aluminum (Al) and silver (Ag) — protected and enhanced layers
• Number of sputter targets: 4
• Power options: DC pulsed or DC sputter power
• Target adjustment: Electrically adjustable inclination and target-to-substrate distance; positions savable in production recipes
• Pre-cleaning: MF or DC glow discharge units integrated in the chamber (moisture removal and cleaning; cycles savable in recipes)
• Substrate handling: Lower chamber half on rails for full access and fast substrate exchange
• Maximum substrate diameter supported: up to 4.5 m
• Designed use: Astronomical and precision optical mirrors requiring high reflectance, uniform coatings and durability
• Operation & maintenance: Designed for easy access to targets, substrates and process components for simplified maintenance and recipe-based repeatability