- Products
- Process ultra-pure water purification unit
- Evoqua Water Technologies
Process ultra-pure water purification unit VANOX® POU-Findustrialcompact
Add to favorites
Compare this product
Characteristics
- Applications
- process, industrial
- Options
- compact
Description
Overview
A compact, ultra-clean point-of-use (POU) filtration system designed to remove particles from Ultra Pure Water (UPW) supplying critical wet/clean tools in semiconductor fabrication.
Detailed description
Semiconductor manufacturing requirements have outpaced conventional particle metrology and final filtration used in UPW systems. Conventional final filters have pore sizes close to, or larger than, the critical sizes that generate so-called "killer" defects. As device geometries approach 10 nm and smaller, controlling particles at the point of use is essential.
Components and non-steady-state conditions across a UPW distribution loop—piping, valves and transient events—can generate or release particles that contaminate tools. The VANOX® POU‑F System mitigates this risk by applying validated materials and point-of-use particle-removal technology to minimize particle transfer to critical tools.
Leveraging over a decade of Vanox deployments in immersion lithography, the POU‑F adapts that particle-control technology for broader fab use. The system integrates with Evoqua's Microelectronics Technology Suite to provide real-time monitoring and data-driven operation.
Key features
Benefits
Technical specifications
A compact, ultra-clean point-of-use (POU) filtration system designed to remove particles from Ultra Pure Water (UPW) supplying critical wet/clean tools in semiconductor fabrication.
Detailed description
Semiconductor manufacturing requirements have outpaced conventional particle metrology and final filtration used in UPW systems. Conventional final filters have pore sizes close to, or larger than, the critical sizes that generate so-called "killer" defects. As device geometries approach 10 nm and smaller, controlling particles at the point of use is essential.
Components and non-steady-state conditions across a UPW distribution loop—piping, valves and transient events—can generate or release particles that contaminate tools. The VANOX® POU‑F System mitigates this risk by applying validated materials and point-of-use particle-removal technology to minimize particle transfer to critical tools.
Leveraging over a decade of Vanox deployments in immersion lithography, the POU‑F adapts that particle-control technology for broader fab use. The system integrates with Evoqua's Microelectronics Technology Suite to provide real-time monitoring and data-driven operation.
Key features
- Semi C79-0113 compliant
- 95% recovery rate
- Validated to the 10 nm level
- Non-metallic pump construction
- Built from ultra-clean validated materials
- Delivery pressure controlled and manually adjustable to match UPW supply pressure
- Real-time data integration with Evoqua's Microelectronics Technology Suite
Benefits
- Improved particle removal at tool inlet for critical clean tools
- Reduces particles that can cause yield and performance loss
- Extends run time between preventive maintenance for wet/clean equipment
- Designed and validated for ultra-clean semiconductor production environments
Technical specifications
- Compliance: Semi C79-0113
- Recovery rate: 95%
- Particle removal validation: to 10 nm level
- Pump: non-metallic construction
- Materials: ultra-clean validated materials
- Delivery pressure: controlled and manually adjustable to match UPW supply pressure
- Data integration: compatible with Evoqua Microelectronics Technology Suite for real-time data
Catalogs
No catalogs are available for this product.
See all of Evoqua Water Technologies‘s catalogsOther Evoqua Water Technologies products
High Purity Systems
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.