Magnetron sputtering machine OPT-S 1500

vertical in-linefor automotive applications

Overview
OPT-S 1500 is a magnetron sputtering optical coating system with an effective coating area of Φ940 × H1000 mm and a chamber of Φ1200 × H1650 mm. It integrates ion-source etching and 8 sputtering sources (planar or cylindrical options) and is designed for high-uniformity multilayer optical coatings for lenses, automotive panels, displays, LiDAR and head-up displays. Supported film types include cut-off, band-pass, RGB filters, AR, hard AR, IR-AR, HR, AS/AF and ITO coatings.

Key Benefits

• 8 sputtering sources with planar or cylindrical configurations to suit process requirements
• Online optical monitoring for real-time spectral tracking and deposition endpoint control
• Vertical planetary workpiece motion (revolution and rotation) for uniform film-thickness distribution on optical multilayers
• Sputtering process delivers dense, adherent films with low absorption and scattering losses
• Touch-screen HMI and PLC control for recipe-driven process operation
• Vacuum management via multiple molecular pumps (5 molecular pumps)

Applications and Film Types

• Applications: optical lenses, automotive panels, display screens, LiDAR modules, head-up displays
• Film types: cut-off filters, band-pass filters, RGB filters, AR (anti-reflective), hard AR, IR-AR, HR (high-reflectance), AS/AF (anti-smudge/anti-fingerprint) and ITO coatings

Equipment Design & Features

• Integrated vertical system with side-opening door and two viewing windows for process observation
• Vertical planetary cylindrical workpiece carrier supporting both revolution and rotation
• Workpiece carrier specification: Φ170 × 12 shafts (adjustable per requirements)
• Chamber Size (Diameter × Height): Φ1200 × H1650 mm
• Effective Coating Area (Diameter × Height): Φ940 × H1000 mm
• Working temperature: adjustable from room temperature up to 300°C
• Ultimate vacuum: ~8 × 10⁻5 Pa (no-load, clean-room condition)
• Equipment footprint (L × W × H): 4.0 × 2.1 × 2.8 m

Technical Specifications

• Model: OPT-S 1500
• Coating Technology: Magnetron sputtering
• Etching Technology: Ion-source etching
• Substrate Materials: Glass, crystalline materials, polymers, ceramics and metals
• Equipment Structure: Integrated vertical system; side-opening door; 2 viewing windows
• Chamber Size (Diameter × Height): Φ1200 × H1650 mm
• Effective Coating Area (Diameter × Height): Φ940 × H1000 mm
• Workpiece Carrier Specification: Φ170 × 12 shafts; adjustable according to requirements
• Workpiece Carrier Motion: Vertical planetary cylindrical carrier system (revolution and rotation)
• Sputtering Sources: 8 (planar / cylindrical options)
• Working Temperature: Room temperature to 300°C
• Ultimate Vacuum: ~8 × 10⁻5 Pa (no-load, clean-room condition)
• Equipment Dimensions (L × W × H): 4.0 × 2.1 × 2.8 m
• Control: Touch-screen HMI and PLC control
• Vacuum System: Multiple molecular pumps (5 molecular pumps)