OverviewOPT-S 800 is a magnetron sputtering optical coating system with an effective coating area of Φ650 × H450 mm and a chamber of Φ1150 × H980 mm. The system integrates ion-source etching and four sputtering sources, available in planar or cylindrical configurations. The OPT-S series is built for high-uniformity multilayer coatings used in optical lenses, automotive panels, display screens, LiDAR modules and head-up displays (HUD).
Applications- Optical lenses
- Automotive exterior and interior panels
- Display and touchscreen panels
- LiDAR and sensing optics
- Head-up displays (HUD)
Listed Film Types- Cut-off filters
- Band-pass filters and RGB filters
- AR (anti-reflective) coatings
- Hard AR
- IR-AR
- HR (high-reflective) coatings
- AS/AF (anti-smudge / anti-fingerprint) coatings
- ITO (transparent conductive) coatings
Key Benefits- Four sputtering sources with planar or cylindrical options for flexible process setup
- Online optical monitoring for real-time spectral feedback and deposition endpoint control of multilayer stacks
- Planetary (revolution and rotation) substrate motion to ensure uniform film-thickness distribution during multilayer deposition
- Sputtering process produces dense, well-adhered optical films with low absorption and scattering losses
Features- Effective coating area: Φ650 × H450 mm
- Chamber size: Φ1150 × H980 mm
- Workpiece carrier: Φ135 × 10 shafts (adjustable); vertical planetary cylindrical carrier
- Touch-screen interface and PLC control
- Two molecular pumps (system vacuum components)
Product Parameters (table)Model: OPT-S 800
Coating Technology: Magnetron sputtering
Etching Technology: Ion-source etching
Substrate Materials: Glass, crystalline materials, polymers, ceramics, metals
Equipment Structure: Integrated vertical system; side-opening door; 2 viewing windows
Chamber Size (Diameter × Height): Φ1150 × H980 mm
Effective Coating Area (Diameter × Height): Φ650 × H450 mm
Workpiece Carrier Specification: Φ135 × 10 shafts; adjustable
Sputtering Sources: 4; planar / cylindrical options
Working Temperature: Room temperature to 300°C (adjustable)
Ultimate Vacuum: 8 × 10⁻⁵ Pa (no-load, clean-room condition)
Process Gases: Argon, nitrogen, oxygen, acetylene
Equipment Dimensions (L × W × H): L3.8 × W1.8 × H2.3 m
Technical specifications- Model: OPT-S 800
- Coating method: Magnetron sputtering
- Etching method: Ion-source etching
- Chamber: Φ1150 × H980 mm
- Effective coating area: Φ650 × H450 mm
- Workpiece carrier: Φ135 × 10 shafts, vertical planetary
- Sputtering sources: 4 (planar or cylindrical options)
- Temperature range: RT to 300°C
- Ultimate vacuum: 8 × 10⁻⁵ Pa (no-load, clean-room condition)
- Process gases: Ar, N2, O2, C2H2
- Dimensions: L3.8 × W1.8 × H2.3 m