Thickness measuring system Aleris®

spectroscopicfor film

The Aleris® 9350 film metrology system delivers reliable, high-precision measurements of film thickness, refractive index, stress and composition for a broad range of general films supporting advanced logic, DRAM and 3D NAND. Built on our latest platform with a high-brightness light source and updated optical systems, Aleris 9350 leverages broadband spectroscopic ellipsometry (BBSE) technology to deliver industry-leading productivity and performance for general film applications. With recipe porting and cross-platform matching capabilities, the system provides a comprehensive solution for qualifying and monitoring diverse film layers, helping fabs maintain process control and accelerate time to yield. Engineering analysis, Inline process monitor, Tool monitor, Process tool matching Aleris 8330 The Aleris 8330 film metrology system is a low cost-of-ownership solution for non-critical films, including inter-metal dielectrics, photoresists, bottom anti-reflective coatings, thick oxides and nitrides, and back end of line layers. Aleris 8350 The Aleris 8350 is a high-performance film metrology system that meets the tighter process tolerances required for thickness, refractive index and stress measurements on critical films. The Aleris 8350 film thickness measurement system is used for advanced film development, characterization and process control for a wide range of critical films, including ultra-thin diffusion layers, ultra-thin gate oxides, advanced photoresists, 193nm ARC layers, ultra-thin multi-layer stacks, and CVD layers. Aleris 8510 The Aleris 8510 extends the Aleris Family’s film thickness measurements, composition