Thickness measuring system SpectraFilm™

spectroscopicfor filmhigh-precision

The SpectraFilm™ F10 and F20 film metrology systems deliver precise thin film measurements for critical layers in advanced logic and memory devices. Powered by a high-brightness light source and expanded-wavelength broadband spectroscopic ellipsometry technology, they provide fast, reliable measurements across complex process flows. The SpectraFilm F10 targets gate all around transistor architectures at 2nm and below and the latest DRAM nodes, offering sub-angstrom precision to control super lattice HKMG layers and maintain tight threshold voltage (Vt) distribution for fine-tuning performance. The SpectraFilm F20 enables accurate control of thin and thick layers in 3D NAND structures with hundreds of pairs, supporting the continued scaling of high-capacity memory. Collectively, the SpectraFilm systems help chipmakers achieve the precision and productivity required for today’s most demanding designs. Applications Bandgap monitoring, Engineering analysis, Inline process monitor, Tool monitor, Process tool matching Related Products The SpectraFilm F1 film metrology system provides reliable, high-precision measurements of thin and thick film thickness, refractive index and stress for a broad range of film layers at the 7nm design node and beyond. The SpectraFilm™ LD10 film metrology system provides reliable, high-precision measurements of thin and thick film thickness, refractive index and stress for a broad range of film layers at the 16nm design node and beyond.