Optical inspection machine Archer™

for patterned wafersfor the electronics industrydefect

The Archer™ 800 overlay metrology system provides accurate feedback of on-product overlay error for fast technology ramps and stable production of leading-edge memory and logic devices. Wavelength tunability and optimization per layer with nanometer-level resolution delivers accurate and robust characterization of overlay issues associated with innovative patterning techniques, including EUV lithography. With productivity levels that meet evolving market needs, the Archer 800 imaging-based overlay system supports increased sampling for high order scanner corrections and high throughput for inline monitoring. Advanced algorithms and a novel rAIM® overlay target design produce improved correlation between target and device overlay errors, helping lithographers accurately track device overlay performance. Applications On-product overlay control, Inline monitoring, Scanner qualification, Patterning control, Brightfield critical dimension (CD) Imaging-based overlay metrology system with a tunable light source for accurate, process robust, high productivity overlay error measurement of ≤7nm logic and advanced memory design nodes. Imaging-based overlay metrology system for advanced memory and ≤10nm logic devices. Dual imaging- and scatterometry-based overlay measurement modules for a range of process layers at the 2Xnm/1Xnm design nodes.