With a Lower Detection Limit (LDL) of 45 parts-per-trillion (ppt), the DF-560E provides the semiconductor industry with industry-best oxygen (O2) measurements for quality control in ultra-high-purity (UHP) electronic grade gas.
High stability coulometric trace and percent measurements
A no-compromise solution
Simple maintenance and reduced ongoing costs
Designed to measure ultra-trace O2 to the very lowest levels, the DF-560E delivers the semiconductor industry an industry-leading 45ppt LDL. Flexible and adaptable, it is able to monitor O2 in multiple background gases while logging data in a variety of formats.
The DF-560E negates the effects of upset-prone applications, thanks to Servomex’s high-stability Coulometric sensing technology, which delivers a fast speed of response in the presence of sample and flow rate changes.
Designed for ease of use
Ideal for semiconductor fabs and analytical carts, the DF-560E is optimized for ease of use and portability. Operation is made via the front panel or digital communications, while hand-carry options make it easy to transport.
The DF-560E also reduces operational costs through its non-depleting, factory-calibrated Coulometric technology, providing cost-effective setup and configuration. The only ongoing maintenance requirement is an annual span calibration, with no programmable cell replacement needed.
High stability coulometric trace and percent measurements