AcXys Technologies provides a thin film coating equipment (UL-Coat) which allow thin deposit ...
The Bernex™ ATL Aluvap CVA (Chemical Vapor Aluminizing) coating systems are designed to deposit an aluminide diffusion layer on hot section turbine components such as turbine blades and stators.
In the past ten years, the inlet temperature for gas turbines has risen from 1100(°)C to 1230(°)C (gas ...
Bernex brand CVD equipment is the reference for reliability and quality. Since it was launched in the early 1970s, the Bernex ...
Ionbond's Bernex Plasma-Assisted Chemical vapor Deposition (PaCVD or PeCVD) coating equipment allows ...
Cluster, single to multi-chamber.
The AltaCVD product ...
The AltaCVD product line combines Altatech's unique technologies for your mature CVD applications and advanced materials deposition.
Specifications
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DLCcs - Diamond Like Carbon Coating System
The Leybold Optics DLCcs is a high vacuum PECVD (Plasma Enhanced Chemical Vapour Deposition) system for precision optics applications. The DLCcs chambers are used by industry leaders to produce optical and thermal imaging systems. The Leybold Optics R&D and process team is your partner for customized processes.
Extremely hard layer ...
Process flexibility
The PECVD deposition tool SI 500 PPD facilitates standard processes for depositing SiO2, SINx, SiOxNy, and a-Si in a temperature range of RT to 350 °C.
Vacuum loadlock
The SI 500 PPD features vacuum loadlock and dry pumping unit for oil-free, higher throughput, and cleanliness ...
Exceptional high density plasma
The SI 500 D features exceptional plasma properties like high density, low ion energy, and low pressure deposition of dielectric films.
Planar ICP plasma source
SENTECH proprietary Planar Triple Spiral Antenna (PTSA) ICP plasma source allows for high efficient low power coupling.
Outstanding ...
