 |
 |
Focused ion beam system AURIGA Carl Zeiss Microscopy
AURIGA® - Your crossbeam workstation AURIGA, the CrossBeam System combines the 3D imaging and analysis performance of the GEMINI e-Beam column with the ability of a FIB for material processing and sample preparation on a nanoscopic scale. Available as AURIGA 40 and AURIGA 60 with different chamber designs you profit from maximum flexibility in industrial quality control and...
 |
 |
Focused ion beam system FB-2200 FIB Hitachi High-Technologies Europe
The FB-2200 allows for rapid and precise specimen preparation for both transmission and scanning electron microscopy of semiconductors and other advanced materials. Features High precision and high milling rates The use of a new low aberration ion optical system allows a maximum beam current of 60 nA at an accelerating voltage of 40 kV. A...
 |
 |
Focused ion beam system JEM-9320 Jeol
The JEM-9320FIB Focused Ion Beam System uses an ion beam generated from a gallium (Ga) liquid metal ion source to fabricate specimens. The field-emission electron gun (FEG) provides a high beam current (30nA) with an extremely...
 |
 |
Focused ion beam system Morgan Advanced Ceramics
The origin of DIAMONEX's proprietary ion beam equipment dates back to collaborative efforts between DIAMONEX and several notable Russian institutes and laboratories....
 |
 |
Spellman’s FIBX power supply is an integrated multiple output high voltage power supply specifically designed for focused ion beam. Typical applications include transmission and scanning electron microscopy; semiconductor analysis, milling and repair; disc drive head trimming, ion beam etching and focused ion-beam lithography. A modular design approach allows...
