X-ray fluorescence spectrometer FISCHERSCOPE® XDV-µ® WAFER

automaticmeasurementautomated

Cutting-edge technology for wafer applications. Special equipment for automated measurements of thin films and multilayer systems on wafers with diameters from 6 - 12 inches. Fischer DPP+ ¹ for highest precision even with short measuring times Polycapillary optics produced in-house² with smallest spot size 10 µm (FWHM) Automatic image recognition for reliable measuring of small structures Meets all requirements for accurate wafer control. Due to the programmable measuring table with vacuum wafer chuck and microfocus tube Ultra, the FISCHERSCOPE® X-RAY XDV®-µ WAFER is optimally tailored to the needs of the semiconductor industry. Polycapillary optics built into the XRF device concentrate the X-ray radiation on smallest measuring spots of 10 or 20 µm for short measuring times at high intensity. This allows you to analyze individual microstructures much more precisely than with conventional devices - and completely automated. Fully integrated solution. XDV®-μ SEMI combined with wafer handler of your choice Accurate and precise. Positioning of the measuring point on small structures thanks to automatic image recognition Meeting all challenges. Reliable and fast results for ambitious measuring tasks Fully automatable. Let your instrument work for you with just one click Most advanced polycapillary optics on the market. Our in-house manufactured polycapillary optics deliver outstanding measurement results at short measuring times DPP+ digital pulse processor. Shorter measuring times or improvement of standard deviation*