Conductivity measuring instrument HE-960LF

Perfect for Slurry concentration control It is effective to keep the dilution of Slurry constant. Maintaining an appropriate conductivity value contributes to process stability in the wafer polishing process. Even highly viscous sample liquids such as CMP Slurry can be measured without problems because they use a sensor structure that reduces the risk of the sample liquid sticking to the electrodes. In addition, the sensor is made of a wetted material with excellent chemical resistance, which meets the cleanliness requirements of semiconductor processes. In addition to the above, it can also be used for introduction at the semiconductor process development stage and conductivity control of special chemicals. High accuracy / High stability Measurement range : 0 to 2,000 μS/cm , 0 to 10,000 μS/cm Repeatability : ± 0.5% F/S , ± 1.0% F/S Metal contamination free Since special carbon is used for the electrode material, there is no need to worry about metal contamination elution. Equipped with concentration conversion function Two types of concentration conversion are possible by inputting the relationship between the chemical concentration and conductivity and the temperature characteristics. It is especially suitable for dilution control of low-concentration chemicals. Space saving The degree of freedom in installation layout is improved by downsizing from our conventional conductivity sensor.