Chemical monitoring system CS-1000

concentrationmeasurement

The CS-1000 advances semiconductor manufacturing processes by enabling simultaneous measurement of three parameters in chemical solution containing low concentration components. HORIBA Advanced Techno, Co., Ltd. (hereinafter “HORIBA Advanced Techno”) has released its new CS-1000 Chemical Solution Monitoring System. The CS Series of analyzers, which measures the concentration of chemicals used in semiconductor manufacturing processes in real time, has served the needs of the industry for nearly 30 years since its launch in 1995. The CS-1000, a stand-alone system boasting improved performance, makes it possible to detect specific chemicals that are present in chemical solutions in trace quantities (ppm*1 level) without any pretreatment, thanks to a unique algorithm (patent pending*2) that combines the analysis of absorbance,*3 conductivity, and pH. By enabling simultaneous measurements of three parameters—concentration (up to eight chemical components), conductivity, and pH—at an update cycle as short as six seconds,*4 the CS-1000 contributes to the advancement of quality control. Since it requires only approximately four hours*5 of maintenance every six months, the CS-1000 also helps to reduce downtime. In addition, the CS-1000 supports the simultaneous measurement of two different chemical solutions, contributing to increased productivity. With the miniaturization of semiconductors, the chemicals used to manufacture them have become increasingly diverse, such as those containing many components or trace components. This requires strict quality control covering multiple parameters