analysis microscope / SEM / high-resolution / high-speed
1.2 nm, 1.6 nm, 4 nm
Min.: 20 unit
Max.: 1,000,000 unit
Advances in the development of new materials featuring complex nanostructures places increased demands on FIB-SEM instruments for exceptional resolution, accuracy and throughput. In response, JEOL has developed the JIB-4700F Multi Beam System to be used in morphological observations, elemental and crystallographic analyses of a variety of specimens.
The JIB-4700F features a hybrid conical objective lens, GENTLEBEAM™ (GB) mode and an in-lens detector system to deliver a guaranteed resolution of 1.6nm at a low accelerating voltage of 1 kV. Using an "in-lens Schottky-emission electron gun" that produces an electron beam with a maximum probe-current of 300nA, this newly-developed instrument allows for high-resolution observations and fast analyses. For the FIB column, a high-current density Ga ion beam of up to 90nA maximum probe-current is employed for fast ion milling and processing of specimens.
Concurrent with high-speed cross-section processing by FIB, high-resolution SEM observations and fast analyses can be conducted utilizing energy dispersive X-ray spectroscopy (EDS) and electron backscatter diffraction (EBSD). Additionally, a three-dimensional analysis function that automatically captures SEM images at certain intervals in cross-section processing is provided as one of the JIB-4700F's standard features.
High resolution SEM observation
Guaranteed resolution of 1.6 nm at a low accelerating voltage of 1 kV is delivered by a magnetic/electrostatic hybrid conical objective lens, GB mode and in-lens detector.