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Ceramic disk 69299-00001-9068
silicon carbidehigh-temperature

Ceramic disk - 69299-00001-9068 - Xiamen Innovacera Advanced Materials Co., Ltd - silicon carbide / high-temperature
Ceramic disk - 69299-00001-9068 - Xiamen Innovacera Advanced Materials Co., Ltd - silicon carbide / high-temperature
Ceramic disk - 69299-00001-9068 - Xiamen Innovacera Advanced Materials Co., Ltd - silicon carbide / high-temperature - image - 2
Ceramic disk - 69299-00001-9068 - Xiamen Innovacera Advanced Materials Co., Ltd - silicon carbide / high-temperature - image - 3
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Characteristics

Shape
disks
Composition
silicon carbide
Other characteristics
high-temperature
Thickness

Min.: 1.9 mm
(0.075 in)

Max.: 2.1 mm
(0.083 in)

Width

Min.: 79.9 mm
(3.15 in)

Max.: 80.1 mm
(3.15 in)

Description

Short description
These SiC porous ceramic discs are engineered for precision vacuum adsorption and air-floating (air bearing) support in semiconductor and advanced manufacturing processes. Manufactured from silicon carbide, they provide high hardness, excellent thermal conductivity and chemical resistance, ensuring stable vacuum holding force and uniform airflow distribution. The discs enable non-contact, low-damage handling of wafers, panels and thin substrates, suitable for high-temperature and high-precision production environments.

Product specifications (summary)
Formula: SiC
Form: Disc
Material: Silicon carbide porous ceramic
CAS Number: 409-21-2
Commodity: Porous ceramic disc

Specifications / Tolerances (Disc)
Thickness: 2 mm (tolerance ±0.1 mm)
Outer diameter: 80 mm (tolerance ±0.1 mm)

Physical Properties
Density: 2.0 - 2.2 g/cm³

Mechanical Properties
Hardness (HRA): ≥ 40.00

Typical Applications
  • Semiconductor vacuum chuck systems (wafer grinding, wafer dicing, printing vacuum chucks)
  • Vacuum chuck cleaning
  • Transfer and handling vacuum chucks
  • Precision air bearing and air-floating platforms
  • LCD and OLED display panel manufacturing
  • Semiconductor microelectronics processing
  • Mobile phone glass and panel handling
  • Thin film processing
  • Laser processing platforms
  • Printing and coating systems
  • Photovoltaic and solar cell production


Key Features
  • Uniform and stable porous structure
  • Reliable vacuum adsorption performance
  • Even airflow distribution for air-floating applications
  • Suitable for non-contact, low-damage handling
  • High dimensional accuracy and consistency
  • Designed for cleanroom and highly clean manufacturing environments


Specifications & Variants
  • Multiple sizes and thicknesses available
  • Different pore structures to meet load and process requirements
  • Consistent pore distribution across specifications


Technical characteristics / Specifications
  • Formula: SiC
  • Form: Disc
  • Material: Silicon carbide porous ceramic
  • CAS Number: 409-21-2
  • Commodity: Porous ceramic disc
  • Disc thickness: 2 mm (tolerance ±0.1 mm)
  • Outer diameter: 80 mm (tolerance ±0.1 mm)
  • Density: 2.0 - 2.2 g/cm³
  • Hardness (HRA): ≥ 40.00
  • Available pore sizes: e.g. 15 μm and 30 μm
  • Packaging: 1 piece per unit

Catalogs

*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.