Pulsed laser system NL200

nanosecondQ-switchedsolid-state

The NL200 series is a compact, air-cooled, Q-switched DPSS nanosecond laser designed for high pulse energy at kHz repetition rates. Its end-pumped design ensures compactness and easy integration into various industrial and R&D laser equipment. Featuring short nanosecond pulse duration, variable repetition rate, and external TTL triggering, the NL200 series is an excellent and cost-effective source for applications requiring higher pulse energy, such as material processing, LCD and OLED display panel repair, ablation, marking, engraving, laser cleaning, and laser deposition. This laser can be equipped with harmonic generation modules for 532 nm, 355 nm, 266 nm, and 213 nm wavelengths, making it a versatile tool for spectroscopy, photoacoustic imaging, and remote sensing. The mechanically stable and hermetically sealed design ensures reliable operation and long component lifetime.

Features

• Customers recognized reliability
• Two years warranty
• Up to 4 mJ pulse energy at 1064 nm
• Up to 2500 Hz variable repetition rate
• 532 nm, 355 nm, 266 nm, 213 nm wavelengths as standard options
• <10 ns pulse duration at 1064 nm
• Electro-optical Q-switching
• Turn-key operation
• Rugged sealed cavity
• Compact size
• Simple and robust
• Air cooled
• External TTL triggering
• Remote control via keypad and/or any controller running on any OS using REST API commands

Applications

• Material processing
• LCD and OLED display panel repair
• Marking
• Micromachining
• Engraving
• Laser deposition
• Laser cleaning
• Ablation
• Spectroscopy
• OPO pumping
• Remote sensing

Benefits

• Continuous tuning of repetition rate while maintaining constant pulse energy, superior beam pointing and energy stability for micromachining, marking, thin film removing applications
• Close to Gaussian smooth beam profile with low value M² < 1.3 and good focusability, beneficial for LCD and OLED display repair
• Compactness and lightness for easy transport and space saving
• Fast wavelength selection for applications requiring alternating wavelengths, such as material ablation and LIBS
• Air cooling, reliable end-pumping technology, amplifier-free DPSS design for easy operation, alignment, installation, and low ownership cost
• Variety of control interfaces (USB, RS232, LAN, WLAN) for easy integration with laboratory or OEM equipment

Specifications

• Pulse energy (at 1064 nm): NL201: 0.9 mJ, NL202: 2.0 mJ, NL204: 4.0 mJ
• Pulse energy (at 532 nm): NL201: 0.3 mJ, NL202: 0.9 mJ, NL204: 2.0 mJ
• Pulse energy (at 355 nm): NL201: 0.2 mJ, NL202: 0.6 mJ, NL204: 1.3 mJ
• Pulse energy (at 266 nm): NL201: 0.08 mJ, NL202: 0.2 mJ, NL204: 0.6 mJ
• Pulse energy (at 213 nm): NL201: 0.04 mJ, NL202: 0.1 mJ, NL204: 0.2 mJ
• Pulse energy stability (StdDev): at 1064 nm: <0.5%, at 532 nm: <2.5%, at 355 nm: <3.5%, at 266 nm: <4%, at 213 nm: <5%
• Typical pulse duration: 7–10 ns
• Power drift: ±2%
• Pulse repetition rate: NL201: 0–2500 Hz, NL202/NL204: 0–1000 Hz
• Beam spatial profile: close to Gaussian in near and far fields
• Ellipticity: 0.9–1.1 at 1064 nm
• M²: <1.3
• Beam divergence: <3 mrad
• Polarization: linear
• Typical beam diameter: 0.7 mm
• Beam pointing stability (RMS): ≤10 µrad
• Optical jitter (StdDev): <0.5 ns
• Laser head size (W × L × H): 164 × 320 × 93 mm
• Power supply unit (W × L × H): 470 × 390 × 140 mm
• Umbilical length: 3 m
• Cooling: air cooled
• Ambient temperature: 18–30 °C
• Relative humidity: 20–80% (non-condensing)
• Power requirements: 100–240 V AC, single phase, 50/60 Hz
• Power consumption: <600 W
• Cleanliness of the room: not worse than ISO Class 9

Note

• Laser must be connected to mains electricity at all times. If disconnected for more than 1 hour, a few hours of warm-up are required before switching on.