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Wafer spin coater VTC-200

wafer spin coater
wafer spin coater
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Description

VTC-200 Spin Coater is mainly used in the lab film formation; Take advantage of coating machine's high speed rotary, coating high coefficient of viscosity sol-gel and solution on the sample surface, widely used in the researching labs, universities and factories. Main Feature : 1. Programmable two segments control speed; 2. Vacuum fasten substrate, easy to operate; 3. Aluminum casting structure(whole machine), stable, low noise Technical Parameter : 1. Speed adjustable:two segments can adjust between 500-6000rpm 2. Time adjustment:two segments 1-60sec 3. Vacuum pump flow rate:more than 60L/min 4. Voltage: AC220/110V 50/60Hz 5. Power: 200W 6. It is suitable for coating of size 153mm, 203.5mm sample and other materials. Specification : Size:500mm x 400mm x 400 mm, Weight:30kgs Standard Accessories : 1. Dia.153mm vacuum chuck : one pc 2. Slurry feeder: 1pc 3. Power cord: 1pc 4. 120L/min oilless vacuum pump

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