Deposition machines

17 companies | 92 products
Deposition machines
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The ULS Series is a range of CVD deposition machine from Acxys. The standard module is designed for depositing non-stochiometric silicon oxide with the use of an organic...

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Application
The P600MR roll-to-roll coater is intended for producing uniform single-sided coatings on polymer films. These coaters can be easily updated to meet customer requirements and ensure deposition of single layers as well as multi-layer stacks for touch panels, LCDs, solar cells and solar control materials. They can also be used for deposition of thick...

Application
The 2P1300M roll-to-roll coater is a unique Sidrabe-developed design for coating highly porous and netted webs. The processed materials are used as batteries elements and in medicine.

Engineering and Technology
The coater is intended for single and double-sided nickel...

Application
Plasma enhanced CVD of p-i-n tandem stack of amorphous hydrogenated silicon on metal foils for production of solar absorbing multi-layers.

Engineering and technology
The PECVD coating system is a roll-to-roll type production plant engineered for one-sided vacuum coating of up to 1,340 mm wide metal foils.
The deposition zone consists...

Application
The PECVD pilot coater is intended for producing p-i-n stacks of amorphous hydrogenated silicon on metal foils. The cotar is used as an experimentation tool for optimization of plasma enhanced chemical vapour deposition of...

The G900MLR is a universal batch coater for deposition of protective-decorative, wear resistant, reflective and functional coatings in a variety of colours on 3D articles. It is universal both in substrate materials being processed (metal, plastic, glass, ceramic and porcelain)...

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Unlike traditional PVD tools, the unique design of the InlineCoater™ makes it well suited for continuous production flows, by handling small loads at a very high throughput. The result is higher productivity and lower cost compared to competing PVD solutions.
Designed for short cycle times
The InlineCoater™ load-lock enables re-loading...

a small machine with a large impact
Metallization of injection moulded plastics has never been easier. The PlastiCoater™ PVD metallization unit is designed to work alongside, and in syncronization with, a moulding machine, creating a truly integrated production unit.
You can integrate continuous quality control into the process to further improve yield.
Designed for...

The ReelCoater™ system focuses on the special needs of the electrical component industry, where production is often reel-to-reel. The system is primarily developed to coat Silver MaxPhase™ but it can also deposit other materials.
The compact size of the system allows it to be easily integrated into existing production lines. Low environmental impact makes it fast...

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The SI 500 D plasma deposition tool represents the leading edge for plasma enhanced chemical vapor deposition of dielectric films, a-Si, SiC, and other materials. It is based on PTSA plasma source, separated gas inlets for reaction gasses, dynamic temperature controlled substrate electrode, fully controlled vacuum...

The SI 500 PPD represents an advanced tool for plasma enhanced chemical vapor deposition of dielectric films, a‑Si, SiC, and other materials. It is based on planar capacitive coupled plasma source, vacuum loadlock, temperature controlled substrate electrode, optional available low frequency mixing, fully...

Depolab 200 is the basic plasma enhanced chemical deposition (PECVD) tool by SENTECH combining the advantages of a parallel plate electrode design for uniform film deposition with cost effective design of direct load. Starting with standard applications on 2 to 8 wafers and...

Atomic Layer Deposition (ALD) is a layer-by-layer deposition process of very thin films with conformal coating on 3D structures. Precise control of thickness and film properties is facilitated by adding precursors in separate steps into the vacuum chamber...

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Purpose:
Multi-layer quarter-wave and non-quarter-wave coatings for visible, UV and IR ranges.

IZOVAC presents the newest series of vacuum coating system ORTUS with electron-beam evaporators ....

Vacuum System for deposition of wear-resistant anti-reflecting diamond - like - carbon ( DLC ) coatings

The...

Principal fields of application:
Production of coatings for flat displays;
Sputtering of laser elements;
Functional coatings;
Production of dielectric filters and mirrors;
Research and development.
Wide range of sputtering materials, possibility to obtain multi-layer,...

Vacuum system Atis 500 is designed for metal coatings application by magnetron sputtering on substrates measuring 60 x 48 mm with preliminary ion-beam treatment.

Description of engineering solutions
Cyclic-action unit with cylindrical chamber 500 mm in diameter and 330 mm high. The chamber is accessed through folding top cover.

The chamber is equipped with cryogenic pump...

Equipment has been developed for deposition of decorative metal layers on plastic and metal articles with maximum dimension h130 mm x d235 mm. Auxiliary option provides for equipment fitting with ion-beam cleaning for adhesion improvement, and technology of deposition of NCVM (non-conductive vacuum metallization) coatings.

General characteristic
Equipment...

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PentaBlue is a PECVD (Plasma Enhanced Chemical Vapour Deposition) coating system where the wafers are coated with an antireflection layer consisting...

SCHMID will accelerate your coating business with the powerful FlexBlue sputtering system. Vacuum deposition is the best solution for the roll to roll coating of flexible materials and it is the unbeatable alternative...

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The TurboDisc® MaxBright® MHP™ GaN MOCVD Multi-Reactor System represents the latest modular high performance system specially designed to produce excellent yield of up to 20% within-wafer wavelength uniformity improvement over...

GaN MOCVD Multi-Reactor System Platform gives out the industry's maximum footprint efficiency. MOCVD system is designed in such a way to produce high quality, high brightness emitting LEDs. MaxBright M gives up to 15% improved efficiency, serviceability...

The Turbo Disc K475 metal organic chemical vapor deposition system is engineered to provide high volume production for some compound semiconductor devices. These devices include the...

The TurboDisc® K465i HP™ GaN MOCVD System offers higher yields and increased productivity. The system has a high performance reactor which has been designed in order to increase within-wafer...

The TurboDisc® K465i™ series is manufactured by Veeco, and is a Gan MOCVD...

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NANO-MASTER state-of-the-art Sputtering Systems come with water cooled rotating 8” platen and up to three off-axis planar magnetrons. The system is pumped with a turbomolecular pump and achieves low 10-6 Torr within 15 minutes. RF or DC power is applied to the individual magnetron...

NANO-MASTER, Inc. PECVD systems are capable of depositing high quality SiO2, Si3N4, or DLC films on up to 8” diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source...

Nano-Master, Inc. has developed the first Table Top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for InGaN and AlGaN deposition processes. The features...

Atomic layer deposition provides a unique method for depositing defect free ultrathin films on surfaces. This technique uses sequential surface reactions to coat substrates with high conformality and precise thickness control at the atomic scale.

The process consists of sequential introduction of desired precursor vapors with hydroxyl groups, each of which forms about...

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General Information
1-linear-cathode compact hardcoating unit
Based on PLATIT cathodic ARC-technology
Coating...

General Information
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS) above 200°C,...

General Information
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS)...

General Information

Dedicated coating unit for DLC3 (ta-C) coatings
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating temperature 50°C to 500°C
πsCOAT® - New Innovation

π smooth COATING: Straight forward ARC filtering
DLC3 Coatings

Standard coatings: VIc3® , cVIc3®...

General Information
Compact hard coating unit
Based on the brand new PLATIT technologies:
LARC® : LAteral Rotating ARC Cathodes
CERC®: CEntral Rotating ARC Cathode
Coating on tool steels (TS) above 230 °C,
high speed steels (HSS)...

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The Rocklinizer equipment, using the Rocklinizing process, applies a hard and wear resistant surface of Tungsten Carbide, Titanium Carbide and Rockhard electrode material to repair metals, tools and dies.

The...

Rocklinizer Model 850 / 850E with ROTARY APPLICATOR - Deposits from .0002" to .007" in a single application, controllable...

600 / 600E - Deposits from .0001" to .004" in a single application, controllable...

500 / 500E - Deposits from .0001" to .002" in a single application, controllable...

ungsten carbide applied to one side of a sharpened blade provides a self sharpening edge akin to the Beaver Tooth effect in nature. The dentine wears away faster than the enamel as the Beavers lower jaw works against the upper jaw. This hard-soft...

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1. Anhydrous marks cleansing.
2. Demand for mining clean room construction...

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The Great Orion® Star 8 Hybrid, manufactured by Desun Industries®, is a...

The GREAT ORION® STAR 8 Hybrid is manufactured by Densun. It is a PVD...

The Great Orion® Star 6 Standard, manufactured by Deslin, is a PVD coater...

The Great Orion® Star 4 Hybrid, manufactured by Desun Industries®, is a...

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AltaCVD High Temp® performs HTCVD deposition commonly used in the fabrication of semiconductors, LED and MEMS. This is a flexible and cost effective system which can be used stand alone...

AltaCVD Advanced Materials® performs Pulsed MOCVD/ALD deposition commonly used in the fabrication of Semiconductors, LED, MEMS. This is a flexible and cost effective system which can be used stand alone or combined with our innovative AltaCVD® chambers.
Processes

Processes have been thoroughly...

AltaCVD Silane® performs PECVD deposition commonly used in the fabrication of Semiconductors, LED, MEMS and Solar cells. This is a flexible and cost effective system which can be used stand alone or combined with...

AltaCVD Teos® performs PECVD and HPCVD deposition commonly used in the fabrication of semiconductors, LED and MEMS. This is a flexible and cost effective system which can be used stand alone or combined with our innovatives AltaCVD®...

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The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It...

Leybold Optics SYRUSpro is an industry leader in production and R&D. This machine produces superior coatings at extremely competitive rates. The SYRUSpro is ideal for AR-coating applications such as band pass, notch filters or...

High productivity, best performance, lowest cost of ownership, production proven... These are the highlights of the ARES family. ARES coating systems have been developed to meet the requirements of Chinese and Asian mass production oriented markets. To be close to our customers in the center of...

NESSY II is a second generation magnetron sputter system mainly used for the production of EUV extreme ultraviolet mirrors under UHV conditions. It is designed for mass production as well as...

The Leybold Optics DLCcs is a high vacuum PECVD (Plasma Enhanced Chemical Vapour Deposition) system for precision optics applications. The DLCcs chambers are used by industry leaders to produce optical and thermal imaging...

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The fully automated deposition plants of the VERA series have been developed by VTD for industrial use. They are particularly suitable for the inexpensive high-precision optical coating of planar and convex components.

The equipment in each individual deposition plant is precisely customised to the requirements of the respective user. Various applications are possible in terms of...

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