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... for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. ...
... The EVG®610 is a compact and multi-purpose R&D system that can handle small substrate pieces and wafers up to 200 mm. The EVG610 supports a variety of standard lithography processes, such as vacuum-, hard-, soft-, and proximity exposure ...
EV Group
... The EVG®620 NT provides state-of-the art mask alignment technology on a minimized footprint area up to 150 mm wafer size. Known for its versatility and reliability, the EVG620 NT provides state-of-the-art mask ...
EV Group
... Overview
This
wafer exposure (
mask
aligner) integrates an original UV optical system optimized for high‑definition exposure and a precision mechanism to parallelize photomask and
wafer. ...
... Overview
- Bench-top wafer exposure system (mask aligner) designed for R&D and small-lot production environments.
- Supports three gap control modes: Hard contact, Soft contact
... Product
Full-automatic
wafer exposure system (
mask
aligner) for LED chip production. Compatible with Micro LED and standard LED
wafers; available in two combined-size versions ...
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