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... for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment ...
The EVG®610 is a compact and multi-purpose R&D system that can handle small substrate pieces and wafers up to 200 mm. The EVG610 supports a variety of standard lithography processes, such as vacuum-, hard-, soft-, and ...
EV Group
The EVG®620 NT provides state-of-the art mask alignment technology on a minimized footprint area up to 150 mm wafer size. Known for its versatility and reliability, the EVG620 NT provides state-of-the-art ...
EV Group
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