Differential pressure flow controller GP200

massfor gasanalog

GP200 Series is the first fully pressure-insensitive pressure-based mass flow controller (P-MFC) designed specifically for advanced Etch and Deposition processes in semiconductor manufacturing. The GP200 Series P-MFC features a patented architecture that overcomes the limitations of conventional P-MFCs to provide the most precise process gas delivery even when delivering low vapor pressure process gases. It includes several unique design aspects, including an integrated differential pressure sensor coupled with a downstream valve architecture enabling the most precise process gas delivery over the widest range of operating conditions in the industry. Since GP200 Series supports such a broad range of process conditions, it can be used as a drop-in replacement and upgrade for many traditional P-MFCs and thermal MFCs. It reduces the complexity and cost of ownership of the gas delivery system because it eliminates the need for components such as pressure regulators and transducers. Get more details about the design of GP200 Series and see how it works. Features True differential pressure measurement Lower inlet pressure operation Downstream valve architecture Matched transient response Zero Leak-by Control Valve MultiFloTM technology offers unparalleled flexibility—one device can be programmed for thousands of different gas and flow range configurations without removing the MFC from the gas line or compromising accuracy Local display indicates flow, temperature, pressure and network address DeviceNetTM, EtherCAT®, RS-485 L-Protocol and analog interfaces