Fast responding, repeatable delivery of process gases with high and ultra-high levels of purity—that’s the performance the GF100 series of metal sealed mass flow controllers and meters provides. Designed for semiconductor, MOCVD and other gas flow control applications, the GF100 series exceeds the semiconductor industry standard for reliability, ensuring repeatable, highly stable performance over time. Standard MultiFloTM technology enables one MFC to support thousands of gas types and range combinations without removing it from the gas line or compromising on accuracy.
The result: increased process flexibility and efficiency combined with the industry’s highest levels of process gas purity to help maximize yields and productivity.
Long-term zero stability of <±0.5% full scale per year
Settling times: 300 ms - <700 ms or 700 ms - <1 second
Full-scale flow rates up to 300 slpm
All-metal seal flow path: option for 4µ or 10µ inch Ra surface finish
Corrosion-resistant Hastelloy® T-Rise sensor improves measurement reproducibility at elevated temperatures
MultiFloTM gas and range programmability—one device, thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy
Optional SDS gas delivery
DeviceNetTM, RS-485 L-Protocol and analog interfaces
High-performance components marathon tested to seven times semiconductor industry standards for reliability
All metal, corrosion resistant flow path with reduced surface area and unswept volumes ensures faster dry-down during purge steps
With MultiFloTM, new process gases and/or ranges can be set in under 60 seconds – no more removing and calibrating