FE-SEM microscope SEM5000X
laboratoryfor quality controlfor materials analysis

FE-SEM microscope - SEM5000X - CIQTEK Co., Ltd. - laboratory / for quality control / for materials analysis
FE-SEM microscope - SEM5000X - CIQTEK Co., Ltd. - laboratory / for quality control / for materials analysis
FE-SEM microscope - SEM5000X - CIQTEK Co., Ltd. - laboratory / for quality control / for materials analysis - image - 2
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Characteristics

Type
FE-SEM
Technical applications
laboratory, for quality control, for materials analysis
Ergonomics
touchscreen tablet
Microscope head
trinocular
Observation technique
bright field, in-situ
Configuration
floor-standing
Light source
LED illumination
Electron source
Schottky field emission, tungsten filament
Ion source
gallium
Detector type
back-scattered electron, in-lens SE, EBSD
Options and accessories
computer-assisted
Other characteristics
digital camera, USB, ultra-high resolution
Magnification

Min.: 1 unit

Max.: 2,500,000 unit

Resolution

Min.: 0.6 nm

Max.: 1 nm

Weight

400 kg
(881.8 lb)

Length

90 cm
(35.4 in)

Width

95 cm
(37.4 in)

Height

158 cm
(62.2 in)

Description

CIQTEK SEM5000X FESEM Microscope Specifications Electron Optics Resolution: 0.6 nm @ 15 kV, SE 1.0 nm @ 1 kV, SE Acceleration Voltage: 0.02kV ~30 kV Magnification: 1 ~ 2,500,000 x Electron Gun Type: Schottky Field Emission Electron Gun Specimen Chamber Cameras: Dual Cameras (optical navigation + chamber monitor) Stage Type: 5-Axis Mechanical Eucentric Specimen Stage Stage Range: X=110 mm, Y=110 mm, Z=65 mm T: -10*~+70°, R: 360° SEM Detectors and Extensions Standard: In-lens Detector Everhart-Thornley Detector (ETD) Optional: - Retractable Back-Scattered Electron Detector (BSED) Retractable Scanning Transmission Electron Microscopy Detector (STEM) Low Vacuum Detector (LVD) Energy Dispersive Spectrometer (EDS / EDX) Electron Backscatter Diffraction Pattern (EBSD) Specimen Exchange Loadlock (4 inch / 8 inch) Trackball & Knob Control Panel Duo-Dec mode (Duo-Dec) The CIQTEK SEM5000X is an ultra-high resolution FESEM with optimized electron optics column design, reducing overall aberrations by 30%, achieving ultra-high resolution of 0.6 nm@15 kV and 1.0 nm@1 kV. Its high resolution and stability make it advantageous in advanced nano-structural materials research, as well as the development and manufacturing of high-technology node semiconductor IC chips. # Breakthrough Resolving Power # Mechanical Eucentric Specimen Stage # *Dual Beam Deceleration Mode (Duo-Dec) # *Specimen Exchange Loadlock (8 inches compatible) # High Stability # Excellent Expandability

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