- Industrial machines and equipment
- Surface Treatment
- Koyo Thermos Systems
- Products
- Catalogs
- News & Trends
- Exhibitions
Steel annealing RLA-3100-Vlarge series
Add to favorites
Compare this product
Characteristics
- Treated material
- steel
- Production method
- large series
Description
Enables contact annealing and GaN substrate processing. Supports 6-inch wafers and enables activation and oxidation in vacuum (LP) environments/N2 load-lock atmospheres.
Features
Maximum operating temperature: 1,200°C
Supports a wide range of wafer sizes up to 6 inches.
An automatic wafer replacement mechanism provides cassette-to-cassette transfer.
Vacuum support improves annealing characteristics.
N2 load-lock support enables rapid turnaround time.
Can process GaN substrates.
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.