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Annealing furnace 200
oxidationdiffusionbell

annealing furnace
annealing furnace
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Characteristics

Function
annealing, oxidation, diffusion
Configuration
bell
Heat source
electric
Other characteristics
horizontal, laboratory, for the electronics industry

Description

From small experiments and researches (R&D) to mass-production, the furnaces can be designed to meet users’ needs. The horizontal furnaces can be used for solar battery and photovoltaic power system (PV) production as well as silicon wafers. From experimental usage to mass production, various equipment configuration is available Batch:25 to 150 wafers processing is available 1 to 4 stacks furnace configuration is implemented for taking advantage of limited square available 2 to 8 inch and 300mm wafer size are available LGO heater for Low and medium high temperature, HGC heater for high temperature are provided for excellent temperature performance Proposing equipment configuration according to the customer’s needs based on usage, space, and budget Simple and well equipped control system These horizontal furnaces can be designed to meet users’ requests ranging from experiments and research (R&D) of 3-, 4-, 6- and 8-inch wafers and 125-mm and 156-mm square cells to mass-production. As well as silicon wafers, the furnaces can be used for solar battery and photovoltaic power system (PV) production by phosphorus diffusion, boron diffusion, pyrogenic oxidation, wet oxidation, dry oxidation, annealing, etc. using POCl3, BBr3, etc.
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.