High-temperature baking in a clean environment is enabled by the heat-resistant high-performance filter and unique cooling unit. A hot-air circulation system is used to highly accurately carry out wafer and glass substrate baking/aging, polyimide curing and annealing.
A heat-resistant high-performance filter and our unique cooling unit are installed to enable high-temperature baking.
The chamber interior can maintain class 100 cleanliness when the temperature is stable.
There are 2 hot-air blower types: front side blower with horizontal circulation (type V) and side blower (type III). Both achieve high thermal efficiency and good temperature uniformity.
This type of oven is optimal for semiconductor wafer and glass substrate baking, aging and other heat treatments requiring high accuracy.
Inert gases can be introduced into the chambers to use the ovens as inert gas ovens.