Oxidation furnace RLA-1200

annealingbellgas

This lamp annealing system for 4-inch to 8-inch wafers achieves high-quality processing even for use in R&D. Activation and oxidation are available in a vacuum (LP) environment and N2 load-lock atmosphere. Features High performance process with R&D Low-cost system by manual susceptor transfer Upper & lower cross lamp structure and soaking furnace improve the uniformity of in-plane temperature 4- to 8-inch wafer size is available Equipped with an operator-friendly high performance control system Vacuum designed quartz tube enables accurate gas substitution and process at vacuum pressure This lamp annealing system for the R&D of 4-inch to 8-inch wafers saves processing cost thanks to high-speed heating at 200°C/sec and manual susceptor transfer. The structure using the upper and lower cross halogen lamps achieves superior in-plane temperature uniformity, making both low-cost and high-quality processing reality. Thanks to the quartz tube designed to include a vacuum resistant property, processing is available in a clean vacuum (LP) environment and N2 load lock atmosphere.