Chamber furnace VF-5300H

annealingnitridingcleaning

A vertical furnace enabling high-temperature processing, ideal for power device manufacturing. Supports oxynitriding and wafers of up to 8 inches in size. Features an automatic wafer transfer mechanism, and can be used for mass production. Features Supports max. 75 wafers (200mm / 8-inch) or max. 100 wafers (150mm / 6-inch), and use on mass-production lines. Supports a wide range of wafer sizes up to 8 inches. Enables temperature monitoring in wafer vicinity. The furnace interior features our proprietary metal-free construction. Supports serial processing of different oxidizing/oxynitriding processes (wet/dry oxidizing, H2 annealing, NH3 nitriding, NO/N2O oxynitriding). Chamber cleaning mechanism (option) VF-5300H is a vertical furnace that can process a maximum of 100 wafers per lot, and a wide range of wafer sizes from 3 to 8 inches. Carefully selected hardware and control system features enable use on mass-production lines. The furnace interior features our proprietary metal-free construction. VF-5300H enables high-temperature processing, making it ideal for power device manufacturing. It can also perform oxynitriding.