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... The 3935 and 3920 EP broadband plasma defect inspection systems support wafer-level defect discovery, yield learning and inline monitoring for ≤5nm logic and leading-edge memory design nodes. With a light ...
KLA Corporation
... Overview
Comprehensive wafer
defect
inspection and review systems for discovery, classification and monitoring of pattern and surface
defects across R&D and production. Systems combine broadband ...
KLA Corporation
... TThe C30x Series broadband plasma optical defect inspectors enable systematic defect discovery and latent reliability defect detection for chip manufacturing for the automotive, IoT, 5G, consumer electronics ...
KLA Corporation
... memory devices. Part of a portfolio of advanced wafer defect inspection and review tools, the Puma 9980 provides the highest throughput solution for production ramp monitoring by enhancing capture of defect ...
KLA Corporation
... system include: front side wafer defect inspection; wafer edge defect inspection, profile, metrology and review; backside wafer defect inspection and ...
KLA Corporation
... ) and normal illumination (NI), detect unique defect types for bare wafers, smooth and rough films, and fragile resists and litho stacks. Image based defect classification (IBC) using revolutionary machine ...
KLA Corporation
... uses machine-learning automatic defect classification to produce an accurate defect pareto. The data generated by the eDR7380 enables faster defect sourcing in development, faster excursion ...
KLA Corporation
The Archer™ 800 overlay metrology system provides accurate feedback of on-product overlay error for fast technology ramps and stable production of leading-edge memory and logic devices. Wavelength tunability and optimization per layer with nanometer-level ...
KLA Corporation
... of a broad range of defects of interest (DOI). Full-surface coverage is achieved in minutes, with the Candela 8420 surface defect inspection system to produce high resolution imaging and automated inspection ...
KLA Corporation
... broad range of defects of interest (DOI). This system employs proprietary optical technology to simultaneously measure scatter intensity at two angles of incidence. The Candela 8520 provides surface and photoluminescence defect ...
KLA Corporation