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... The Axion® T2000 X-ray dimensional metrology system produces high resolution, fast, accurate, precise, non-destructive 3D shape measurements of the high aspect ratio structures used in advanced 3D NAND and DRAM chips. Leveraging innovative ...
KLA Corporation
... Optical Critical Dimension (CD) and Shape Measurement Systems The SpectraShape™ 12k dimensional metrology system is used to fully characterize and monitor the critical dimensions (CD) and three-dimensional ...
KLA Corporation
... DRAM nodes, offering sub-angstrom precision to control super lattice HKMG layers and maintain tight threshold voltage (Vt) distribution for fine-tuning performance. The SpectraFilm F20 enables accurate control of thin ...
KLA Corporation
... a high-performance film metrology system that meets the tighter process tolerances required for thickness, refractive index and stress measurements on critical films. The Aleris 8350 film thickness measurement system ...
KLA Corporation
... with KLA’s 5D Analyzer® data analytics system to feed results to the scanner to improve on-product overlay and overall device yield. Applications Process monitoring, Inline monitoring, Lithography overlay control PWG5™ ...
KLA Corporation
... temperature measurement systems, available in both 300mm and 200mm configurations, captures the effects of the plasma etch process environment on production wafers under real process conditions. The EtchTemp-HD measurement ...
KLA Corporation
... The HighTemp™ series of in situ wafer temperature measurement systems, available in both 300mm and 200mm configurations, is designed to optimize and monitor advanced film processes (FEOL and BEOL ALD, CVD and PVD) and other elevated temperature ...
KLA Corporation
... temperature measurement system, available in both 300mm and 200mm configurations, supports monitoring of wet clean and other wet processes. The WetTemp series monitor wafers are compatible with most single wafer wet clean process systems ...
KLA Corporation
... The UV Wafer™ in situ ultraviolet (UV) light 300mm measurement system utilizes wireless sensor wafer technology to measure UV light dosage and intensity at the wafer surface within film deposition process tools. Enabling ...
KLA Corporation
... process monitoring, Wafer patterning control Related Products Mask metrology system for the 10nm design node, supporting measurement on both standard registration marks and on-device pattern features. Mask metrology ...
KLA Corporation