{{product.productLabel}} {{product.model}}
{{#if product.featureValues}}{{product.productPrice.formattedPrice}} {{#if product.productPrice.priceType === "PRICE_RANGE" }} - {{product.productPrice.formattedPriceMax}} {{/if}}
{{#each product.specData:i}}
{{name}}: {{value}}
{{#i!=(product.specData.length-1)}}
{{/end}}
{{/each}}
{{{product.idpText}}}
{{product.productLabel}} {{product.model}}
{{#if product.featureValues}}{{product.productPrice.formattedPrice}} {{#if product.productPrice.priceType === "PRICE_RANGE" }} - {{product.productPrice.formattedPriceMax}} {{/if}}
{{#each product.specData:i}}
{{name}}: {{value}}
{{#i!=(product.specData.length-1)}}
{{/end}}
{{/each}}
{{{product.idpText}}}
... resolution of defect issues, including Setup 2.0 infrastructure for scalable enhancements to inspection recipe setup, and DualSENS™ linkage between the 3935 optical inspector and e-beam review systems for enhanced defect ...
KLA Corporation
... High-productivity broadband inspection for diverse substrates (Si, SiC, GaN, glass) and wafer sizes (150/200/300mm) with DesignWise® and DefectWise® AI.
KLA Corporation
... optimization of new processes, design nodes and devices during R&D. In production, the C30x systems’ high sensitivity at optical inspection speed enable inline monitoring for critical process layers, helping fabs avoid ...
KLA Corporation
... The Puma™ 9980 laser scanning inspection system incorporates multiple sensitivity and speed enhancements that enable capture of critical defects of interest (DOI) at throughputs required for high volume manufacturing for 1Xnm advanced ...
KLA Corporation
... latest-generation CIRCL5 system include: front side wafer defect inspection; wafer edge defect inspection, profile, metrology and review; backside wafer defect inspection and review; and, optical ...
KLA Corporation
... within fabs. Unpatterned wafer surface inspection system with DUV sensitivity and high throughput for IC, substrate and equipment manufacturing at the sub 1Xnm design nodes. Unpatterned wafer surface inspection system ...
KLA Corporation
... supports wafer and chip manufacturing for wide-bandgap semiconductors. It provides high resolution images of defects and uses machine-learning automatic defect classification to produce an accurate defect pareto. The data generated by ...
KLA Corporation
The Archer™ 800 overlay metrology system provides accurate feedback of on-product overlay error for fast technology ramps and stable production of leading-edge memory and logic devices. Wavelength tunability and optimization per layer with nanometer-level ...
KLA Corporation
... Tantalate, Lithium Niobate, glass, sapphire and other compound semiconductor materials. This surface defect inspection system employs proprietary OSA ( optical surface analyzer) architecture to simultaneously measure scatter ...
KLA Corporation
... interest (DOI). This system employs proprietary optical technology to simultaneously measure scatter intensity at two angles of incidence. The Candela 8520 provides surface and photoluminescence defect inspection for ...
KLA Corporation