Field emission scanning electron microscope SU8600
for analysis3Dcold field emission

field emission scanning electron microscope
field emission scanning electron microscope
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Characteristics

Type
field emission scanning electron
Technical applications
for analysis
Observation technique
3D
Electron source
cold field emission
Detector type
back-scattered electron, energy-dispersive X-ray detector
Other characteristics
automated, ultra-high resolution
Magnification

Min.: 20 unit

Max.: 2,000,000 unit

Resolution

0.6 nm, 0.7 nm

Description

The SU8600 brings in a new era of ultrahigh-resolution cold-field emission scanning electron microscopes to the long-standing Hitachi EM lineup. This revolutionary CFE-SEM platform incorporates multifaceted imaging, automation, increased system stability, efficient workflows for users of all experience levels, and more. UltraHigh-Resolution Hitachi’s high-brightness cold field emission source provides ultrahigh-resolution images even at Ultra-low voltages. Left: RHO-type Zeolite particle at low-kV. In order to reveal fine steps structure on surface, the image was acquired at 0.8 kV of landing voltage. This allows the very fine structure of surface steps to be clearly visible (image on right). A Smart Detection System for Low Voltage BSE Imaging Cross section image of 3D NAND; Oxide layer and Nitride layer of capacitor are easily distinguishable in the image due to BSE detection capability. Fast BSE Imaging : New Out-Column Crystal Type BSED (OCD) By using new Out-Column Crystal Type BSED (OCD)*, image acquisition time was less than ONE SECOND, yet lower layer interconnect and Fin FET structure of SRAM are clearly visible. Enhanced User Experience with Advanced Automation The “EM Flow Creator“ software option allows users to configure repeatable SEM operation sequences. Various SEM functions can be assembled in the EM Flow Creator’s window by a drag-and-drop method and then saved as a recipe for later use. Once a recipe is configured, automated data collection under the set conditions can be performed with high accuracy and repeatability. Flexible Interface Dual monitor configuration supports a flexible and highly efficient workspace.

Exhibitions

Meet this supplier at the following exhibition(s):

36th Control 2024
36th Control 2024

23-26 Apr 2024 Stuttgart (Germany) Stand 7103

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    The Advanced Materials Show

    15-16 May 2024 Birmingham (United Kingdom)

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    *Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.