OverviewInnovacera’s high-voltage shielded vacuum feedthrough is a through-wall electrode engineered for reliable transmission of high voltage into vacuum chambers while maintaining a hermetic ceramic-to-metal seal. An integrated grounded shield suppresses high-voltage field interference to reduce leakage and electrical breakdown risk in demanding vacuum and precision high-voltage systems.
Key features- Integrated grounded shield for EMI suppression and isolation of high-voltage fields
- Electrical rating: 5 kV DC / 3.6 A
- Weldable 304 stainless steel housing for permanent chamber attachment
- Ceramic-to-metal hermetic sealing
- Welded plug-free structure option available
- Designed to minimize leakage and prevent electrical breakdown in vacuum environments
Materials (available options)- Alumina (Al2O3)
- Aluminum Nitride (AlN)
- Zirconia (ZrO2)
- Boron Nitride (BN)
- Silicon Carbide (SiC)
- Silicon Nitride (Si3N4)
- Porous ceramics
- Machinable glass ceramics
- Zirconia-toughened alumina (ZTA)
Applications- Semiconductor processing equipment
- Mass spectrometers
- Ultra-high vacuum (UHV) systems
- Optics and photonics instruments
- Electrical and electronic test equipment
- Energy systems requiring high-voltage feedthroughs
- Medical and life-science instruments
- Research and laboratory vacuum apparatus
- Other precision high-voltage vacuum equipment
Frequently noted functional points- Weldable 304 stainless steel housing enables direct welding to chamber walls for permanent UHV hermetic sealing
- Grounded shielding reduces leakage risk and lowers potential for electrical breakdown under high-voltage vacuum conditions
Technical specifications- Electrical rating: 5 kV DC, 3.6 A
- Housing material: 304 stainless steel (weldable)
- Sealing: Ceramic-to-metal hermetic sealing
- Structure: Welded, plug-free structure option available
- Maximum pressure (withstand): 1400 PSIG @ 20°C
- Working temperature (plug-free configuration): -269°C to 450°C
- Working temperature (with plug): -65°C to 165°C
- Primary benefits: EMI suppression, isolation of HV fields, minimized leakage, prevention of electrical breakdown
- Typical use environments: vacuum chambers, UHV systems, semiconductor processing equipment, mass spectrometers